| | Manufacturer | Description | Process Name | Vintage | Industry | Wafer Size | Status |
|
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| | SMS AWS-12-02-15355 Wet Etch/Clean | ETCH | 1993 | FAB | 200 | AVAILABLE |
|
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| | Jenoptic Infab ergospeed SLE 200 SMIF Loader | AUXILIARY | 1999 | FAB | 200 | AVAILABLE |
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| ADE | ADE 9530-NT Ultra Gage Measurement System | INSPECTION & METROLOGY | 2003 | FAB | 200 | SOLD |
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| AG ASSOCIATES | AG Associates Heatpulse 8800 RTP | DIFFUSION AND RTP | 2000 | FAB | 200 | AVAILABLE |
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| ALCATEL | Alcatel ADS 301 Dry Pump | AUXILIARY | 1995 | FAB | none | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Producer TC/DARC PECVD | DEPOSITION | 2005 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Producer BPSG PECVD | DEPOSITION | 2000 | FAB | 200 | AVAILABLE |
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| APPLIED MATERIALS | Applied Materials Producer BPSG PECVD | DEPOSITION | 2003 | FAB | 200 | AVAILABLE |
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| APPLIED MATERIALS | Applied Materials Producer BPSG PECVD | DEPOSITION | 1999 | FAB | 200 | AVAILABLE |
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| APPLIED MATERIALS | Applied Materials Producer BPSG PECVD | DEPOSITION | 2002 | FAB | 200 | AVAILABLE |
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| APPLIED MATERIALS | Applied Materials P-5000 MK-II Oxide PECVD | DEPOSITION | 1993 | FAB | none | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials P-5000 MK-II Oxide PECVD | DEPOSITION | 1993 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials P-5000 MK-II Oxide Etch | ETCH | 1995 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials P-5000 MK-II Oxide Etch | ETCH | 1992 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials P-5000 MK-II Oxide Etch | ETCH | 1993 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials P-5000 MK-II Nitride PECVD | DEPOSITION | 1992 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials P-5000 MK-II Nitride PECVD | DEPOSITION | 1995 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials P-5000 MK-II Nitride PECVD | DEPOSITION | 1995 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials P-5000 MK-II Nitride PECVD | DEPOSITION | 1994 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials P-5000 DCVD xP | DEPOSITION | 1996 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Mirra Mesa CMP Tungsten | CMP | 2000 | FAB | 200 | AVAILABLE |
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| APPLIED MATERIALS | Applied Materials Mirra 3400 CMP Poly | CMP | 2000 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Endura 5500 VHP | DEPOSITION | 1997 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials DR SEMVision G3 | INSPECTION & METROLOGY | 2005 | FAB | 300 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Mirra Mesa CMP Oxide | CMP | 2004 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Endura 5500 SL SYS | DEPOSITION | 2004 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Endura 5500 HP PVD T/TiNitride | DEPOSITION | 1995 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Endura 5500 HP PVD Al/Ti/TiN | DEPOSITION | 1995 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials DR SEMVision cX | INSPECTION & METROLOGY | 2000 | FAB | 200 | AVAILABLE |
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| APPLIED MATERIALS | Applied Materials Centura 5200 Tungsten PECVD | DEPOSITION | 1996 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Centura 5200 Tungsten PECVD | DEPOSITION | 2000 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Centura 5200 Oxide PECVD | DEPOSITION | 1996 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | Applied Materials Centura 5200 DPN/RTP | DIFFUSION AND RTP | 2004 | FAB | 200 | AVAILABLE |
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| APPLIED MATERIALS | Applied Materials Centura 5200 Tungsten PECVD | DEPOSITION | 2004 | FAB | 200 | AVAILABLE |
|
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| APPLIED MATERIALS | AMAT Centura 5200 DxZ | DEPOSITION | 2006 | FAB | 200 | AVAILABLE |
|
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| APPLIED THERMAL SYSTEMS | CLASS 1 ROBOTIC WORK CELL SYSTEM | AUXILIARY | 2000 | FAB | 200 | AVAILABLE |
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| ASYST | ASYST SMIF ARM 1150 | WAFER SORT & HANDLING | 1997 | FAB | 150 | SOLD |
|
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| AXCELIS/FUSION | Eaton/Axcelis Fusion Gemini GPL 220 IP | ETCH | 2005 | FAB | 200 | AVAILABLE |
|
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| AXCELIS/FUSION | Eaton/Axcelis Fusion Gemini GPL 220 IP | ETCH | 2005 | FAB | 200 | AVAILABLE |
|
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| BIO-RAD | Bio-Rad QS-2200 FTIR Measurement System | INSPECTION & METROLOGY | 2000 | FAB | 200 | AVAILABLE |
|
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| BOC-EDWARDS | BOC Edwards TCS2 Thermal Conditioning Units | AUXILIARY | 2001 | FAB | none | AVAILABLE |
|
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| BOC-EDWARDS | BOC Edwards E2M80 vacuum Pump- 3 available | AUXILIARY | 1998 | FAB | none | AVAILABLE |
|
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| CANON | Canon FPA 3000 iW Stepper | LITHOGRAPHY / RESIST | 2002 | FAB | 200 | AVAILABLE |
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| COMET | Comet R2D Wafer Handler | WAFER SORT & HANDLING | | FAB | 200 | SOLD |
|
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| DISCO | Disco Grinder Model DFG 840 | GRIND & TAPE | nov 1995 | FAB | 200 | SOLD |
|
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| DNS | DNS SSW-80A-AR Wafer Scrub | WET PROCESS | 1996 | FAB | 200 | AVAILABLE |
|
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| DNS | DNS SSW-80A-AR Wafer Scrub | WET PROCESS | 1996 | FAB | 200 | AVAILABLE |
|
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| DNS | DNS SSW-80A Wafer Scrub | WET PROCESS | 1996 | FAB | 200 | AVAILABLE |
|
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| DNS | DNS SSW-80A Wafer Scrub | WET PROCESS | 1996 | FAB | 200 | AVAILABLE |
|
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| DNS | DNS AS 2000 CMP Wafer Scrub | CMP | 2000 | FAB | 200 | AVAILABLE |
|
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| EATON / AXCELIS | Eaton/Axcelis GSD III/LED Ultra Implanter | IMPLANT | 2003 | FAB | 200 | AVAILABLE |
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| GASONICS | Gasonics PEP Iridia Resist Asher | ETCH | 1998 | FAB | 200 | AVAILABLE |
|
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| GASONICS | GaSonics A-3000 Resist Asher | ETCH | 1993 | FAB | 200 | AVAILABLE |
|
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| HITACHI | Hitachi WS-50-4STD8 Wafer Sort | WAFER SORT & HANDLING | 1998 | FAB | 200 | SOLD |
|
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| HITACHI | Hitachi M-511AE Poly Etch | ETCH | 2001 | FAB | 200 | AVAILABLE |
|
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| HITACHI | Hitachi M-511AE Poly Etch | ETCH | 2001 | FAB | 200 | AVAILABLE |
|
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| KARL SUSS | Karl Suss Front-Side Mask Aligner | LITHOGRAPHY / RESIST | 1987 | FAB | 150 | AVAILABLE |
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| KARL SUSS | Karl Suss Double Sided Mask Aligner | LITHOGRAPHY / RESIST | 1996 | FAB | 150 | AVAILABLE |
|
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| KLA/TENCOR | KLA/Tencor P-22 Thin Film Metrology System | INSPECTION & METROLOGY | 1999 | FAB | 200 | AVAILABLE |
|
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| KLA/TENCOR | KLA/Tencor FLX-5400 Thin Film Metrology System | INSPECTION & METROLOGY | 2001 | FAB | 200 | AVAILABLE |
|
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| KLA/TENCOR | KLA/Tencor FLeXus-5400 Thin Film Metrology System | INSPECTION & METROLOGY | 1995 | FAB | 200 | AVAILABLE |
|
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| KLA/TENCOR | KLA/Tencor OmniMap RS-100 | INSPECTION & METROLOGY | 2001 | FAB | 200 | AVAILABLE |
|
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| KLA/TENCOR | KLA/Tencor 2401 Viper Wafer Defect Inspection | INSPECTION & METROLOGY | 2000 | FAB | 200 | AVAILABLE |
|
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| KOKUSAI | Kokusai DJ-853V-8BL Poly LPCVD Furnace | DIFFUSION AND RTP | 2001 | FAB | 200 | AVAILABLE |
|
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| LAM | LAM Alliance (A4) 9400 ICP Poly/Nitride Etch | ETCH | 1996 | FAB | 200 | SOLD |
|
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| LAM | Lam Research Alliance (A6) Exelan Oxide Etch | ETCH | 2000 | FAB | 200 | AVAILABLE |
|
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| LAM | Lam Research 4528 Oxide Etch | ETCH | 1997 | FAB | 200 | AVAILABLE |
|
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| LAM | Lam Research 4428 Rainbow Poly Etch | ETCH | 1996 | FAB | 200 | AVAILABLE |
|
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| LAM | Lam Research 4428 Rainbow Poly Etch | ETCH | 1996 | FAB | 200 | AVAILABLE |
|
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| LAM | Lam Alliance A4 TCP 9400 | ETCH | 1995 | FAB | 150 | SOLD |
|
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| LEICA | Wild Heerbrugg M8 binocular (6 - 50 magnification) | LAB EQUIPMENT | TBA | FAB | none | AVAILABLE |
|
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| LEICA | Wild Heerbrugg M3 binocular | LAB EQUIPMENT | tba | FAB | none | AVAILABLE |
|
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| LEICA | Ergolux AMC with CD2 Line width measurement system | INSPECTION & METROLOGY | 1998 | FAB | 150 | AVAILABLE |
|
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| MATHESON | Matheson Semi-Gas Gas Cabinet | AUXILIARY | 1999 | FAB | none | AVAILABLE |
|
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| MATHESON | Matheson Semi-Gas Gas Cabinet | AUXILIARY | 1999 | FAB | none | AVAILABLE |
|
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| MATHESON | Matheson Semi-Gas Gas Cabinet | AUXILIARY | 1999 | FAB | none | AVAILABLE |
|
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| MATTSON | Mattson Aspen II Ashing/Stripping | ETCH | 2001 | FAB | 200 | AVAILABLE |
|
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| NIKON | Nikon NSR 2205 EX12B DUV Stepper | LITHOGRAPHY / RESIST | 1997 | FAB | 200 | AVAILABLE |
|
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| NOVELLUS | Novellus Concept 2 Dual Sequel Express | DEPOSITION | 2001 | FAB | 200 | AVAILABLE |
|
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| NOVELLUS | Novellus Concept 2 Dual Sequel | DEPOSITION | 1997 | FAB | 200 | AVAILABLE |
|
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| SEMITOOL | Semitool Storm 3 Cassette Cleaning | WET PROCESS | 1996 | FAB | 200 | AVAILABLE |
|
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| SEMIX | Semix 8171 SOG coater 200mm SMIF | DEPOSITION | 1999 | FAB | 200 | AVAILABLE |
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| SHIBAURA | Shibaura SC200-D/D-2SR Back Side Wafer Scrub | WET PROCESS | 2001 | FAB | 200 | SOLD |
|
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| STEAG / AST | Steag/Mattson (SCP) Wet Hood Wet Etch/Clean | WET PROCESS | 2001 | FAB | 200 | AVAILABLE |
|
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| STEAG / AST | Steag/Mattson (SCP) Wet Hood Wet Etch/Clean | WET PROCESS | 2000 | FAB | 200 | AVAILABLE |
|
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| STEAG / AST | AST/Mattson/Steag 2800 E RTP | DIFFUSION AND RTP | 2000 | FAB | 200 | SOLD |
|
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| TANTEC | Tantec Contac Angle Measurement Tool | INSPECTION & METROLOGY | n/k | FAB | none | SOLD |
|
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| TEL | TEL α-808SC Nitride LPCVD | DIFFUSION AND RTP | 1997 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Unity IIe 855DD Oxide Etch | ETCH | 2000 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Unity IIe 855 IA Nitride Etch | ETCH | 2000 | SMT | none | AVAILABLE |
|
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| TEL | TEL Unity IIe 85 PPA Nitride Etch | ETCH | 1996 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Unity EP TiN PECVD | ETCH | 2004 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Unity EP TiN PECVD | ETCH | 2004 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL PR 200Z Wet Etch/Strip | WET PROCESS | 2000 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL MB2 730 Tungsten PECVD | DEPOSITION | 1999 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Mark 7 Coat/Develop | LITHOGRAPHY / RESIST | 1994 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S-ZA Pyro Furnace | OXIDATION / DIFFUSION / ANNEAL | 1996 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S-ZA Pyro Furnace | OXIDATION / DIFFUSION / ANNEAL | 1996 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S-Z Pyro Furnace | OXIDATION / DIFFUSION / ANNEAL | 2001 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S-Z Pyro Furnace | OXIDATION / DIFFUSION / ANNEAL | 2001 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8SE-EVGN (FTPS & N2LL) Nitride LPCVD | DIFFUSION AND RTP | 2003 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8SE Poly LPCVD | DIFFUSION AND RTP | 2001 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8SE Oxidation APCVD | DIFFUSION AND RTP | 2002 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8SE Nitride LPCVD | DIFFUSION AND RTP | 2003 | FAB | 200 | SOLD |
|
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| TEL | TEL Alpha 8SE LPCVD Furnace | DIFFUSION AND RTP | 2001 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8SE LPCVD Furnace | DIFFUSION AND RTP | 2001 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8SE (N2LL) Selective Oxide LPCVD | DIFFUSION AND RTP | 2001 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8SE (N2 LL) PIX Cure APCVD | DIFFUSION AND RTP | 2002 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8SE (N2 LL) Oxide APCVD | DIFFUSION AND RTP | 2001 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8SE (N2 LL) Nitride LPCVD | DIFFUSION AND RTP | 2003 | FAB | 200 | SOLD |
|
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| TEL | TEL Alpha 8S Poly LPCVD | DIFFUSION AND RTP | 2000 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S Oxidation APCVD | DIFFUSION AND RTP | 1993 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S Nitride LPCVD | DIFFUSION AND RTP | 1993 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S Nitride LPCVD | DIFFUSION AND RTP | 1993 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S Nitride LPCVD | DIFFUSION AND RTP | 1996 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S Nitride LPCVD | DIFFUSION AND RTP | 1993 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S Nitride LPCVD | DIFFUSION AND RTP | 1993 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S Nitride LPCVD | DIFFUSION AND RTP | 1994 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S Anneal/Reflow | DIFFUSION AND RTP | 1994 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S Anneal/Reflow | DIFFUSION AND RTP | 1996 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S Anneal/Reflow | DIFFUSION AND RTP | 1996 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S (N2LL) Oxidation APCVD | DIFFUSION AND RTP | 1993 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Alpha 8S (N2LL) Oxidation APCVD | DIFFUSION AND RTP | 1993 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Act 8 SOD Coat | LITHOGRAPHY / RESIST | 2004 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Act 8 Coater DUV | LITHOGRAPHY / RESIST | 2001 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Act 8 Coater | LITHOGRAPHY / RESIST | 2001 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Act 8 Coat/Developer | LITHOGRAPHY / RESIST | 2004 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Act 8 Coat/Developer | LITHOGRAPHY / RESIST | 2001 | FAB | 200 | AVAILABLE |
|
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| TEL | TEL Act 8 Coat/Develop | LITHOGRAPHY / RESIST | 2001 | FAB | none | AVAILABLE |
|
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| TEL | TEL Act 8 Coat/Develop | LITHOGRAPHY / RESIST | 2001 | FAB | 200 | AVAILABLE |
|
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| THERMAWAVE | Thermawave TP 420 Implant Dose Measurement System | INSPECTION & METROLOGY | 1996 | FAB | 200 | SOLD |
|
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| TRIKON | Electrotech MS6200 Sputterer | DEPOSITION | tba | FAB | 150 | SOLD |
|
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| VARIAN | Varian E500HP Implanter | IMPLANT | 1996 | FAB | 200 | AVAILABLE |
|
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| VARIAN | Varian E220HP | IMPLANT | 1994 | FAB | 200 | AVAILABLE |
|
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| ZEISS | Zeiss Axiotron Wafer Inspection System | INSPECTION & METROLOGY | 1999 | FAB | 200 | SOLD |
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